Method of cleaning a substrate and apparatus for performing the same
US10395951B2 · kind B2 · utility
1Cited by
13References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 24, 2017 |
| Grant date | Aug 27, 2019 |
| Priority date | — |
| Expiry date | May 16, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67253
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
In a method of cleaning a substrate, a protecting liquid may be sprayed to a surface of the substrate from a first position in a first spray direction. Cleaning droplets may be injected on to the surface of the substrate. The protecting liquid may be sprayed to the surface of the substrate from a second position different from the first position in a second spray direction. For example, the protecting liquid may be always sprayed from the central portion toward the edge portions in the substrate so that the protecting liquid on the substrate may have a uniform thickness.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.