Hyo-San Lee
34Patents
6h-index
80Co-inventors
68Inventor score
Filing activity: Oct 29, 2004 → Apr 13, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8344385B2 | Vertical-type semiconductor device | Electricity | 40 | Active |
| US7176041B2 | PAA-based etchant, methods of using same, and resultant structures | Electricity | 21 | Expired |
| US7709277B2 | PAA-based etchant, methods of using same, and resultant structures | Electricity | 20 | Active |
| US8766343B2 | Integrated circuit capacitors having sidewall supports | Electricity | 10 | Active |
| US8119476B2 | Methods of forming integrated circuit capacitors having sidewall supports and capacitors formed thereby | Electricity | 9 | Active |
| US8084367B2 | Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods | Emerging Cross-Sectional Technologies | 7 | Active |
| US8790470B2 | Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods | Emerging Cross-Sectional Technologies | 6 | Active |
| US8685272B2 | Composition for etching silicon oxide layer, method for etching semiconductor device using the same, and composition for etching semiconductor device | Electricity | 4 | Active |
| US8585917B2 | Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods | Emerging Cross-Sectional Technologies | 4 | Active |
| US10029332B2 | Spot heater and device for cleaning wafer using the same | Chemistry; Metallurgy | 4 | Active |
| US10083829B2 | Apparatus for treating substrates using supercritical fluids, substrate treatment system including the same and method of treating substrates using the same | Electricity | 3 | Active |
| US8557651B2 | Method of manufacturing a semiconductor device using an etchant | Electricity | 2 | Active |
| US10525566B2 | Preparing conditioning disk for chemical mechanical polishing and chemical mechanical polishing method including the same | Electricity | 2 | Active |
| US10576582B2 | Spot heater and device for cleaning wafer using the same | Chemistry; Metallurgy | 2 | Active |
| US7857939B2 | Apparatus for treating wafers using supercritical fluid | Emerging Cross-Sectional Technologies | 2 | Active |
| US8795541B2 | Substrate processing method and substrate processing system for performing the same | Electricity | 2 | Active |
| US8211804B2 | Methods of forming a hole having a vertical profile and semiconductor devices having a vertical hole | Electricity | 2 | Active |
| US10395951B2 | Method of cleaning a substrate and apparatus for performing the same | Electricity | 1 | Active |
| US8951383B2 | Apparatus for treating wafers using supercritical fluid | Emerging Cross-Sectional Technologies | 1 | Active |
| US8518772B2 | Fabricating method of semiconductor device | Electricity | 1 | Active |
| US10679843B2 | Method of treating substrates using supercritical fluids | Electricity | 1 | Active |
| US11142694B2 | Etchant composition and method of fabricating semiconductor device | Electricity | 1 | Active |
| US11149234B2 | Cleaning composition, cleaning apparatus, and method of fabricating semiconductor device using the same | Chemistry; Metallurgy | 0 | Active |
| US10668403B2 | Source supplier for a supercritical fluid, substrate processing apparatus having the same | Electricity | 0 | Active |
| US10795263B2 | Compositions for removing photoresist | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.