Methods and apparatuses for effluent monitoring for brush conditioning
US10410936B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 19, 2017 |
| Grant date | Sep 10, 2019 |
| Priority date | — |
| Expiry date | Dec 9, 2037 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B57/02
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An example system for monitoring contamination level of effluent of an offline brush conditioning system includes a first reservoir configured to collect a first effluent from a first portion of a brush in the offline brush conditioning system and a second reservoir configured to collect a second effluent from a second portion of the brush, where the second portion is different from the first portion, and the first and second effluents are from a fluid used to condition a brush configured to clean a surface of a semiconductor wafer. An effluent contamination monitor is configured to monitor a first contamination level of the first effluent and a second contamination level of the second effluent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.