Estimating and eliminating inter-cell process variation inaccuracy
US10415963B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 1, 2015 |
| Grant date | Sep 17, 2019 |
| Priority date | — |
| Expiry date | Jun 1, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/398
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Metrology methods and targets are provided, for estimating inter-cell process variation by deriving, from overlay measurements of at least three target cells having different designed misalignments, a dependency of a measured inaccuracy on the designed misalignments (each designed misalignment is between at least two overlapping periodic structures in the respective target cell). Inaccuracies which are related to the designed misalignments are reduced, process variation sources are detected and targets and measurement algorithms are optimized according to the derived dependency.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.