Patent · US Active

Diamond based current aperture vertical transistor and methods of making and using the same

US10418475B2 · kind B2 · utility

4Cited by
21References
14Claims
0Family size

Assignees

Inventors

Key dates

Filing dateNov 28, 2017
Grant dateSep 17, 2019
Priority date
Expiry dateNov 28, 2037

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D64/62
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A semiconductor structure, device, or vertical field effect transistor is comprised of a drain, a drift layer disposed in a first direction relative to the drain and in electronic communication with the drain, a barrier layer disposed in the first direction relative to the drift layer and in electronic communication with the drain, the barrier layer comprising a current blocking layer and an aperture region, a two-dimensional hole gas-containing layer disposed in the first direction relative to the barrier layer, a gate electrode oriented to alter an energy level of the aperture region when a gate voltage is applied to the gate electrode, and a source in ohmic contact with the two-dimensional hole gas-containing layer. At least one of an additional layer, the drain, the drift region, the current blocking layer, the two-dimensional hole gas-containing layer, and the aperture region comprises diamond.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.