Abrasive particle-dispersion layer composite and polishing slurry composition including the same
US10421883B2 · kind B2 · utility
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14Claims
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Key dates
| Filing date | Dec 21, 2016 |
| Grant date | Sep 24, 2019 |
| Priority date | — |
| Expiry date | Dec 21, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/3212
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
An abrasive particle-dispersion layer composite and a polishing slurry composition including the abrasive particle-dispersion layer composite are provided. The abrasive particle-dispersion layer composite includes abrasive particles, a first dispersant that is at least one cationic compound among an amino acid, an organic acid, polyalkylene glycol and a high-molecular polysaccharide coupled to a glucosamine compound, and a second dispersant that is a cationic polymer including at least two ionized cations in a molecular formula.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.