KCTECH CO., LTD.
35Patents
35Active
35Granted
55Portfolio score
Filing activity: Jan 23, 2015 → Jan 18, 2023
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10518382B2 | Substrate processing system | Electricity | 5 | Active |
| US10002777B2 | Substrate processing system and substrate processing method | Electricity | 5 | Active |
| US11384255B2 | Polishing slurry composition for STI process | Electricity | 2 | Active |
| US11332641B2 | Polishing slurry composition enabling implementation of multi-selectivity | Electricity | 2 | Active |
| US10494547B2 | Additive composition and positive polishing slurry composition including the same | Electricity | 1 | Active |
| US11749549B2 | Substrate processing apparatus with an air curtain in a loading/unloading part | Emerging Cross-Sectional Technologies | 0 | Active |
| US10421883B2 | Abrasive particle-dispersion layer composite and polishing slurry composition including the same | Electricity | 0 | Active |
| US11732217B2 | Cleaning solution composition and cleaning method using the same | Chemistry; Metallurgy | 0 | Active |
| US11592342B2 | Temperature detection device | Physics | 0 | Active |
| US11311979B2 | Apparatus and method for manufacturing display device | Performing Operations; Transporting | 0 | Active |
| US12394627B2 | Substrate polishing system | Electricity | 0 | Active |
| US10138395B2 | Abrasive particle-dispersion layer composite and polishing slurry composition including the same | Electricity | 0 | Active |
| US12305079B2 | CMP slurry composition for polishing polycrystalline silicon and polishing method using same | Performing Operations; Transporting | 0 | Active |
| US11279851B2 | Polishing slurry composition | Electricity | 0 | Active |
| US12247141B2 | Polishing slurry composition | Electricity | 0 | Active |
| US11701693B2 | Substrate processing device comprising door unit having inclined surface | Electricity | 0 | Active |
| US11845912B2 | Cleaning liquid composition and cleaning method using same | Chemistry; Metallurgy | 0 | Active |
| US9994735B2 | Slurry composition for polishing tungsten | Chemistry; Metallurgy | 0 | Active |
| US10784113B2 | Chemical mechanical polishing apparatus | Performing Operations; Transporting | 0 | Active |
| US12037516B2 | Polishing slurry composition and method for producing same | Chemistry; Metallurgy | 0 | Active |
| US12428584B2 | Cerium oxide abrasive particles and polishing slurry composition | Chemistry; Metallurgy | 0 | Active |
| US11279852B2 | CMP slurry compositions and methods of fabricating a semiconductor device using the same | Electricity | 0 | Active |
| US12421424B2 | Slurry composition and method of manufacturing integrated circuit device by using the same | Electricity | 0 | Active |
| US12187919B2 | Polishing slurry composition | Electricity | 0 | Active |
| US11919122B2 | Polishing head, substrate processing apparatus including the same and processing method of substrate using the same | Emerging Cross-Sectional Technologies | 0 | Active |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.