Patent · US Active

Measuring probe

US10422628B2 · kind B2 · utility

2Cited by

18References

16Claims

0Family size

Assignee

Mitutoyo Corporation · JP

Inventors

Atsushi Shimaoka · Kashihara, JP
Tomoyuki Miyazaki · Kakegawa, JP
Kazuhiko Hidaka · Yokohama, JP

Key dates

Filing date	Feb 2, 2017
Grant date	Sep 24, 2019
Priority date	—
Expiry date	Jan 25, 2038

Classification

Technology area (CPC G)Physics
CPC primaryG01B5/012
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A measuring probe includes a stylus having a contact part, an axial motion mechanism, and a rotary motion mechanism. The axial motion mechanism includes first diaphragm structures and a moving member that allows the contact part to move in an axial direction. The rotary motion mechanism includes a second diaphragm structure and a rotating member that allows the contact part to move along a plane perpendicular to the axial direction. The first diaphragm structures are disposed at a symmetric distance with respect to the second diaphragm structure, and the second diaphragm structure is disposed between the first diaphragm structures in the axial direction. The axial motion mechanism supports the rotary motion mechanism, or the rotary motion mechanism supports the axial motion mechanism.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.