Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator
US10428015B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 22, 2016 |
| Grant date | Oct 1, 2019 |
| Priority date | — |
| Expiry date | Oct 30, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08L2312/06
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present invention relates to a compound represented by the general formula (A), a base- and/or radical-generating agent comprising the compound, and so on. In the formula, four pieces of R1 each independently represents a hydrogen atom or a fluorine atom; four pieces of R2 each independently represent a fluorine atom or a trifluoromethyl group; R3, R6, R7 and R10 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms; R4 and R5 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, or R4 and R5 are bonded to each other to represent an alkylene group having 2 to 4 carbon atoms; and R8 and R9 each independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an aryl group having 6 to 14 carbon atoms and optionally having a substituent selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkylthio group having 1 to 6 carbon atoms, a dialkylamino group having 2 to 12 carbon atoms, a halogen atom, and a nitro group, or R8 and R9 are bonded to each other to represent an alkylene group having 2 to 4 carbon atoms; …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.