Kosuke YANABA
6Patents
1h-index
4Co-inventors
33Inventor score
Filing activity: Jun 25, 2014 → Jun 12, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10774062B2 | Photocuring method, compound and composition used therein | Physics | 1 | Active |
| US10428015B2 | Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator | Chemistry; Metallurgy | 1 | Active |
| US10100070B2 | Borate-based base generator, and base-reactive composition comprising such base generator | Chemistry; Metallurgy | 0 | Active |
| US10428014B2 | Base generator, base-reactive composition containing said base generator, and base generation method | Chemistry; Metallurgy | 0 | Active |
| US10451967B2 | Acid- and radical-generating agent and method for generating acid and radical | Chemistry; Metallurgy | 0 | Active |
| US11548984B2 | Light- or heat-curing method and curable resin composition | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.