Method of manufacturing shadow mask using hybrid processing and shadow mask manufactured thereby
US10428415B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 4, 2016 |
| Grant date | Oct 1, 2019 |
| Priority date | — |
| Expiry date | Aug 4, 2036 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S148/143
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention discloses a method of manufacturing a shadow mask, wherein hybrid processing is used to form a mask pattern on the shadow mask, the method includes: forming a wet-etched pattern by performing wet etching from above a base; and forming a laser-processed pattern that continues from the wet-etched pattern, by performing laser processing from above the base or from below the base on which the wet-etched pattern is formed. The present invention uses hybrid processing including wet etching and laser processing for manufacturing a shadow mask. The method has an effect on solving the productivity degradation of the conventional laser processing and provides a shadow mask with high quality using wet etching.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.