AP SYSTEMS INC.
20Patents
20Active
20Granted
55Portfolio score
Filing activity: Aug 4, 2010 → May 11, 2023
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| USD1034493S1 | Chamber wall liner for a semiconductor manufacturing apparatus | General | 13 | Active |
| US10428415B2 | Method of manufacturing shadow mask using hybrid processing and shadow mask manufactured thereby | Emerging Cross-Sectional Technologies | 4 | Active |
| US9318359B2 | Apparatus for substrate treatment and heating apparatus | Electricity | 3 | Active |
| US11450551B2 | Edge ring and heat treatment apparatus having the same | Electricity | 2 | Active |
| US9568372B2 | Apparatus for calibrating pyrometer | Physics | 2 | Active |
| US10490370B2 | Emergency stop apparatus and method | Electricity | 2 | Active |
| US9470581B2 | Apparatus and method of detecting temperature and apparatus for processing substrate | Physics | 1 | Active |
| US9386632B2 | Apparatus for substrate treatment and method for operating the same | Electricity | 1 | Active |
| US10680177B2 | Method of manufacturing shadow mask using hybrid processing and shadow mask manufactured thereby | Electricity | 1 | Active |
| US10106914B2 | Apparatus for manufacturing semiconductor device and method for manufacturing semiconductor device using same | Electricity | 0 | Active |
| US9431279B2 | Heater block and a substrate treatment apparatus | Electricity | 0 | Active |
| US9500530B2 | Apparatus for calibrating pyrometer | Physics | 0 | Active |
| US9117858B2 | Heater block and heat treatment apparatus having the same | Electricity | 0 | Active |
| US11136670B2 | Gas spraying apparatus, substrate processing facility including the same, and method for processing substrate using substrate processing facility | Chemistry; Metallurgy | 0 | Active |
| US8913884B2 | Heater block for a rapid thermal processing apparatus | Electricity | 0 | Active |
| USD1051081S1 | Exhaust wall liner for semiconductor manufacturing apparatus | General | 0 | Active |
| US10985040B2 | Substrate treatment method and substrate treatment apparatus | Physics | 0 | Active |
| US11967492B2 | Thin film manufacturing apparatus | Electricity | 0 | Active |
| US9400425B2 | Apparatus and method for cleaning photomask | Performing Operations; Transporting | 0 | Active |
| US11774370B2 | Apparatus for processing substrate and method for measuring temperature of substrate | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.