Patent · US Active

Lift pin and method for manufacturing same

US10431488B2 · kind B2 · utility

1Cited by
2References
8Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 22, 2016
Grant dateOct 1, 2019
Priority date
Expiry dateJan 22, 2036

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/68757
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A lift pin passes through a hole of a susceptor on which a wafer is placed inside a process chamber in which an epitaxial process is performed with respect to the wafer, to support the wafer, and has a surface formed of a glassy carbon material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.