Pellicle for exposure to extreme ultraviolet light, photomask assembly, and method of manufacturing the pellicle
US10437143B2 · kind B2 · utility
2Cited by
9References
14Claims
0Family size
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Key dates
| Filing date | Jun 20, 2017 |
| Grant date | Oct 8, 2019 |
| Priority date | — |
| Expiry date | Oct 4, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2008
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided is a pellicle for exposure to extreme ultraviolet light (EUVL) according to an example embodiment, and the pellicle includes a pellicle membrane; and a frame attached to the pellicle membrane, wherein the pellicle membrane includes a carbon-based main layer that has a first surface and a second surface, which are two surfaces opposite to each other; and a boron-based enhancement layer covering at least one surface selected from the first surface and the second surface. The pellicle according to an example embodiment may be used for an extended period of time in an extreme ultraviolet light exposure environment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.