Patent · US Active

Sensor assembly and method for determining respective positions of a number of mirrors of a lithography system

US10437155B2 · kind B2 · utility

0Cited by

0References

34Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Jan Horn · Munich, DE
Stefan Krone · Aalen, DE
Lars Berger · Heubach, DE

Key dates

Filing date	Nov 9, 2017
Grant date	Oct 8, 2019
Priority date	—
Expiry date	Dec 9, 2037

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/7085
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

Sensor arrangements, methods for ascertaining a respective position of a number of mirrors of a lithography apparatus, projection systems of a lithography apparatus, and lithography apparatus are disclosed. The sensor arrangement includes at least one position sensor apparatus for providing a position signal for a mirror and an evaluation apparatus for ascertaining the position of the mirror depending on the position signal.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.