Array-based characterization tool
US10438769B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | May 2, 2018 |
| Grant date | Oct 8, 2019 |
| Priority date | — |
| Expiry date | May 2, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2449
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A scanning electron microscopy (SEM) system includes a plurality of electron beam sources configured to generate a primary electron beam. The SEM system includes an electron-optical column array with a plurality of electron-optical columns. An electron-optical column includes a plurality of electron-optical elements. The plurality of electron-optical elements includes a deflector layer configured to be driven via a common controller shared by at least some of the plurality of electron-optical columns and includes a trim deflector layer configured to be driven by an individual controller. The plurality of electron-optical elements is arranged to form an electron beam channel configured to direct the primary electron beam to a sample secured on a stage, which emits an electron beam in response to the primary electron beam. The electron-optical column includes an electron detector. The electron beam channel is configured to direct the electron beam to the electron detector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.