Hard-mask composition
US10438808B2 · kind B2 · utility
0Cited by
0References
8Claims
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Assignee
Inventors
Key dates
| Filing date | May 25, 2016 |
| Grant date | Oct 8, 2019 |
| Priority date | — |
| Expiry date | May 25, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08J2363/00
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Disclosed and claimed herein is a composition for forming a spin-on hard-mask, having a fullerene derivative and a crosslinking agent. Further disclosed is a process for forming a hard-mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.