Andreas Frommhold
11Patents
2h-index
19Co-inventors
43Inventor score
Filing activity: Oct 31, 2013 → Feb 25, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9519215B2 | Composition of matter and molecular resist made therefrom | Electricity | 7 | Active |
| US9229322B2 | Composition of matter and molecular resist made therefrom | Electricity | 2 | Active |
| US9122156B2 | Composition of matter and molecular resist made therefrom | Electricity | 2 | Active |
| US10095112B2 | Multiple trigger photoresist compositions and methods | Chemistry; Metallurgy | 2 | Active |
| US9323149B2 | Methanofullerenes | Emerging Cross-Sectional Technologies | 1 | Active |
| US9383646B2 | Two-step photoresist compositions and methods | Emerging Cross-Sectional Technologies | 1 | Active |
| US9256126B2 | Methanofullerenes | Chemistry; Metallurgy | 1 | Active |
| US11474430B2 | Multiple trigger monomer containing photoresist compositions and method | Physics | 0 | Active |
| US9632409B2 | Fullerenes | Chemistry; Metallurgy | 0 | Active |
| US11681227B2 | Enhanced EUV photoresist materials, formulations and processes | Physics | 0 | Active |
| US10438808B2 | Hard-mask composition | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.