Patent · US Active

Micromechanical system including a sensitive element and associated manufacturing method

US10442681B2 · kind B2 · utility

0Cited by

0References

15Claims

0Family size

Assignee

Robert Bosch GmbH · DE

Inventors

Daniel Haug · Neuffen, DE
Hans-Peter Baer · Pfullingen, DE
Mike Schwarz · Aspenhausiedlung, DE
Volkmar Senz · Metzingen, DE

Key dates

Filing date	Feb 2, 2018
Grant date	Oct 15, 2019
Priority date	—
Expiry date	Feb 2, 2038

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB81C2203/032
WIPO fieldMicro-structural and nano-technology
WIPO sectorChemistry

Abstract

A micromechanical system including a sensitive element, the system including a first area in which the sensitive element is situated, and a second area which at least partially surrounds the first area. Furthermore, the system includes a holding element having an elastic property, which joins the first area to the second area, and a joining material, with the aid of which the second area may be joined to a substrate. A spacing area is provided between the first area and the second area. The joining material extends into the spacing area so that a possible movement of the first area caused by the elastic property of the holding element is limited.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.