Sensor assembly and method for determining respective positions of a number of mirrors of a lithography system
US10444633B2 · kind B2 · utility
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30Claims
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Key dates
| Filing date | Nov 8, 2017 |
| Grant date | Oct 15, 2019 |
| Priority date | — |
| Expiry date | Dec 4, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7085
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A sensor arrangement includes at least one position sensor apparatus for providing a position signal for a mirror and an evaluation apparatus for ascertaining the position of the mirror depending on the position signal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.