Composition for forming underlayer and method for forming underlayer therewith
US10451971B2 · kind B2 · utility
0Cited by
2References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 2, 2016 |
| Grant date | Oct 22, 2019 |
| Priority date | — |
| Expiry date | Feb 2, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/30
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
[Problem] To provide a composition for an underlayer, which can form an underlayer having flattened surface.[Means for Solution] A composition for forming an underlayer, comprising a polymer having a repeating unit containing nitrogen and a solvent. An underlayer is formed by coating this composition on a substrate, preferably baking in an inert atmosphere, and then baking in the air containing oxygen.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.