Go Noya
11Patents
2h-index
22Co-inventors
50Inventor score
Filing activity: Feb 13, 2007 → Apr 3, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8101333B2 | Method for formation of miniaturized pattern and resist substrate treatment solution for use in the method | Emerging Cross-Sectional Technologies | 9 | Active |
| US7998664B2 | Processing liquid for resist substrate and method of processing resist substrate using the same | Physics | 3 | Active |
| US9360756B2 | Composition for forming fine resist pattern and pattern formation method using same | Electricity | 2 | Active |
| US9152052B2 | Composition for forming tungsten oxide film and method for producing tungsten oxide film using same | Electricity | 2 | Active |
| US8501394B2 | Superfine-patterned mask, method for production thereof, and method employing the same for forming superfine-pattern | Emerging Cross-Sectional Technologies | 1 | Active |
| US8568955B2 | Composition for formation of top antireflective film, and pattern formation method using the composition | Physics | 0 | Active |
| US11059995B2 | Film forming composition | Chemistry; Metallurgy | 0 | Active |
| US10451971B2 | Composition for forming underlayer and method for forming underlayer therewith | Physics | 0 | Active |
| US9494867B2 | Rinsing liquid for lithography and pattern forming method using same | Electricity | 0 | Active |
| US10435555B2 | Void forming composition, semiconductor device provided with voids formed using composition, and method for manufacturing semiconductor device using composition | Electricity | 0 | Active |
| US11161982B2 | Film forming composition and film forming method using the same | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.