Film deposition apparatus having a peripheral spiral gas curtain
US10458019B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 5, 2013 |
| Grant date | Oct 29, 2019 |
| Priority date | — |
| Expiry date | Oct 14, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45593
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A gas shower device having gas curtain comprises a first gas shower unit for injecting a reaction gas, thereby forming a reaction gas region, and a second gas shower unit. The second gas shower unit arranged around a periphery of the first gas shower unit comprises a buffer gas chamber for providing a buffer gas, and a curtain distribution plate. The curtain distribution plate further comprises a plurality through holes for injecting the buffer gas, thereby forming a gas curtain around a periphery of the reaction gas region. In another embodiment, an apparatus for depositing film is provided by utilizing the gas shower device having gas curtain, wherein the gas curtain prevents the reaction gas in the reaction gas region from being affected directly by a vacuum pressure so that a residence time of reaction gas can be extended thereby increasing the utilization of reaction gas and film-forming efficiency.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.