Mask cleaning
US10459352B2 · kind B2 · utility
6Cited by
1References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 31, 2015 |
| Grant date | Oct 29, 2019 |
| Priority date | — |
| Expiry date | Oct 6, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70925
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithography system includes a load lock chamber comprising an opening configured to receive a mask, an exposure module configured to expose a semiconductor wafer to a light source through use of the mask, and a cleaning module embedded inside the lithography tool, the cleaning module being configured to clean carbon particles from the mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.