Inventor · Poughkeepsie, NY, US

Norman Chen

26Patents
4h-index
38Co-inventors
63Inventor score

Filing activity: Dec 3, 2003 → Dec 15, 2022

Most-cited inventions

PatentTitleAreaCited byStatus
US7432042B2 Immersion lithography process and mask layer structure applied in the same Physics 34 Expired
US9026977B2 Power rail layout for dense standard cell library Physics 14 Active
US10459352B2 Mask cleaning Physics 6 Active
US8782571B2 Multiple patterning process for forming trenches or holes using stitched assist features Physics 5 Active
US8010915B2 Grid-based fragmentation for optical proximity correction in photolithography mask applications Physics 4 Active
US7642101B2 Semiconductor device having in-chip critical dimension and focus patterns Electricity 3 Active
US10386715B2 Methodology for post-integration awareness in optical proximity correction Physics 2 Active
US8612904B1 Use of polarization and composite illumination source for advanced optical lithography Physics 2 Active
US9443055B2 Methods for retargeting circuit design layouts and for fabricating semiconductor devices using retargeted layouts Emerging Cross-Sectional Technologies 1 Active
US7838205B2 Utilization of electric field with isotropic development in photolithography Physics 1 Active
US7387969B2 Top patterned hardmask and method for patterning Electricity 1 Expired
US7776494B2 Lithographic mask and methods for fabricating a semiconductor device Physics 1 Active
US9171735B2 Method for fabricating a semiconductor integrated circuit with a litho-etch, litho-etch process for etching trenches Physics 1 Active
US8993224B2 Multiple patterning process for forming trenches or holes using stitched assist features Physics 1 Active
US8910094B2 Retargeting semiconductor device shapes for multiple patterning processes Physics 1 Active
US9886543B2 Method providing for asymmetric pupil configuration for an extreme ultraviolet lithography process Physics 0 Active
US9064086B2 Retargeting semiconductor device shapes for multiple patterning processes Physics 0 Active
US11921434B2 Mask cleaning Physics 0 Active
US9484300B2 Device resulting from printing minimum width semiconductor features at non-minimum pitch Emerging Cross-Sectional Technologies 0 Active
US10401837B2 Generating risk inventory and common process window for adjustment of manufacturing tool Emerging Cross-Sectional Technologies 0 Active
US8472005B2 Methodology for implementing enhanced optical lithography for hole patterning in semiconductor fabrication Physics 0 Active
US9091923B2 Contrast enhancing exposure system and method for use in semiconductor fabrication Physics 0 Active
US11256179B2 Mask cleaning Physics 0 Active
US11740563B2 Mask cleaning Physics 0 Active
US9366969B2 Methodology for implementing enhanced optical lithography for hole patterning in semiconductor fabrication Physics 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.