Process for producing a gallium arsenide substrate which includes marangoni drying

US10460924B2 · kind B2 · utility

Assignee

• FREIBERGER COMPOUND MATERIALS GMBH · DE

Inventors

• Wolfram Fliegel · Dresden, DE
• Christoph Klement · Chemnitz, DE
• Christa Willnauer · Dorfhain, DE
• Max Scheffer-Czygan · Chemnitz, DE
• André Kleinwechter · Freiberg, DE
• Stefan Eichler · Dresden, DE
• Berndt Weinert · Freiberg, DE
• Michael Mäder · Coswig, DE

Key dates

• Filing date: Feb 12, 2014
• Grant date: Oct 29, 2019
• Expiry date: Dec 1, 2034

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/24355
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

The present invention relates to a novel process for producing a surface-treated gallium arsenide substrate as well as novel provided gallium arsenide substrates as such as well as the use thereof. The improvement of the process according to the invention is based on a particular final surface treatment with an oxidation treatment of at least one surface of the gallium arsenide substrate in dry condition by means of UV radiation and/or ozone gas, a contacting of the at least one surface of the gallium arsenide substrate with at least one liquid medium and a Marangoni drying of the gallium arsenide substrate. The gallium arsenide substrates provided according to the invention exhibit a so far not obtained surface quality, in particular a homogeneity of surface properties, which is detectable by means of optical surface analyzers, specifically by means of ellipsometric lateral substrate mapping for the optical contact-free quantitative characterization.