Jettable inks for solar cell and semiconductor fabrication

US10465295B2 · kind B2 · utility

Assignee

• ALPHA ASSEMBLY SOLUTIONS INC. · US

Inventors

• Steven Dane Prokopiak · Toms River, US
• Ellen S. Tormey · Princeton Junction, US
• Oscar Khaselev · Plainsboro, US
• Michael T. Marczi · Mount Olive, US
• Bawa Singh · Cherry Hill, US

Key dates

• Filing date: May 19, 2015
• Grant date: Nov 5, 2019
• Expiry date: May 19, 2035

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y02P70/50
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A jettable etchant composition includes 1 to 90 wt % active ingredient, and a remainder containing any combination of the following: 10 to 90 wt % solvent, 0 to 10 wt % reducing agents, <1 to 20 wt % pickling agent, 0 to 5 wt % surfactant, and 0 to 5 wt % antifoam agent. The composition can also include a soluble compound containing at least one element which when dissolved has a higher standard electrode potential than a metal to be etched or a soluble compound containing a group IA element, and a soluble platinum group metal. An ink composition can include a group VA compound or a group IIIA compound in a solvent system formulated to be jettable on a surface at a drop volume of about 5 to about 10 picoliters and to achieve a final sheet resistance of less than about 20 Ω/α of the surface upon activation.