Light source for lithography exposure process
US10477663B2 · kind B2 · utility
1Cited by
10References
20Claims
0Family size
Assignee
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Key dates
| Filing date | Jan 11, 2018 |
| Grant date | Nov 12, 2019 |
| Priority date | — |
| Expiry date | Jan 11, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0088
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A method for generating light is provided. The method includes generating targets with a fuel target generator. The method further includes measuring a period of time during which one of the targets passes through two detection positions on a path along which the targets move. The method also includes exciting the targets with a laser generator so as to generate plasma that emits light. In addition, the method includes adjusting at least one parameter of the fuel target generator or the laser generator according to the measured period of time, when the measured period of time is different from a predetermined value.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.