Integrated circuit (IC) devices with varying diameter via layer
US10483218B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | May 31, 2019 |
| Grant date | Nov 19, 2019 |
| Priority date | — |
| Expiry date | May 31, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/35121
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An integrated circuit (IC) device that includes an IC device layer, at least one electrical connection layer located over the IC device layer, and a varying diameter via layer located over the at least one electrical connection layer. The varying diameter via layer includes (i) an interior region having a plurality of interior region vias and (ii) a perimeter region having a plurality of perimeter region vias. The plurality of interior region vias of the interior region is larger than the plurality of perimeter region vias of the perimeter region. The varying diameter via layer comprises an interior surface that is coupled to an interior surface of the at least one electrical connection layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.