Patent · US Active

Anti-transient showerhead

US10494717B2 · kind B2 · utility

11Cited by

134References

27Claims

0Family size

Assignee

Lam Research Corporation · US

Inventors

Edward Sung · Fremont, US
Colin F. Smith · Rue de l'Église, US
Shawn M. Hamilton · Ramona, US

Key dates

Filing date	Jul 13, 2018
Grant date	Dec 3, 2019
Priority date	—
Expiry date	Jul 13, 2038

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C16/45565
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

Showerheads for semiconductor processing equipment are disclosed that include various features designed to minimize or eliminate non-uniform gas delivery across the surface of a wafer due to gas flow transients within the showerhead.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.