Apparatus and method for correcting arrayed astigmatism in a multi-column scanning electron microscopy system
US10497536B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jul 10, 2017 |
| Grant date | Dec 3, 2019 |
| Priority date | — |
| Expiry date | Jul 10, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2813
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A multi-beam scanning electron microscopy (SEM) system is disclosed. The system includes an electron beam source configured to generate a source electron beam. The system includes a set of electron-optical elements configured to generate a flood electron beam from the source electron beam. The system includes a multi-beam lens array with a plurality of electron-optical pathways configured to split the flood electron beam into a plurality of primary electron beams, and a plurality of electrically-charged array layers configured to adjust at least some of the plurality of primary electron beams. The system includes a set of electron-optical elements configured to direct at least some of the plurality of primary electron beams onto a surface of a sample secured by a stage. The system includes a detector array configured to detect a plurality of electrons emanated from the surface of the sample in response to the plurality of primary electron beams.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.