Apparatus and method for generating a vapor for a CVD or PVD device

US10501847B2 · kind B2 · utility

Assignee

• AIXTRON SE · DE

Inventors

• Michael D. Long · Santa Cruz, US
• Birgit Irmgard Beccard · Aachen, DE
• Claudia Cremer · Lich, DE
• Karl-Heinz Trimborn · Wegberg, DE
• Andy EICHLER · Aachen, DE
• Andreas Poqué · Aachen, DE

Key dates

• Filing date: Jun 17, 2015
• Grant date: Dec 10, 2019
• Expiry date: Mar 29, 2036

Classification

• Technology area (CPC F): Mechanical Engineering; Lighting; Heating
• CPC primary: F22D1/003
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

In a device and a method for generating vapor in a CVD or PVD device, particles are vaporized by bringing the particles into contact with a first heat transfer surface of a vaporization device. The vapor generated by vaporizing the particles is transported by a carrier gas out of the vaporization device and into a single or multistage modulation device. In a vapor transfer phase, second heat transfer surfaces of the modulation device are adjusted to a first modulation temperature, at which the vapor passes through the modulation device without condensing on the second heat transfer surfaces. At an intermission phase, the second heat transfer surfaces are adjusted to a second modulation temperature, at which at least some of the vapor condenses on the second heat transfer surfaces.