Patent · US Active

Measuring method and measuring arrangement for an imaging optical system

US10502545B2 · kind B2 · utility

4Cited by

4References

18Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Ulrich Wegmann · Oberkochen, DE
Hans-Michael Stiepan · Aalen, DE
Jochen Hetzler · Aalen, DE

Key dates

Filing date	Nov 20, 2017
Grant date	Dec 10, 2019
Priority date	—
Expiry date	Nov 20, 2037

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/7085
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A measurement arrangement and a method for measuring a wavefront aberration of an imaging optical system (10) of a microlithographic projection exposure apparatus. The method includes separate measurement of respective wavefront aberrations of different partial arrangements (M1; M2; M3; M1, M3) of the optical elements.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.