Semiconductor device with III-nitride channel region and silicon carbide drift region
US10505032B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 28, 2016 |
| Grant date | Dec 10, 2019 |
| Priority date | — |
| Expiry date | Oct 28, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D62/854
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Techniques are provided for forming a semiconductor device. In an aspect, a semiconductor device is provided that includes a silicon carbide (SiC) structure and a III-nitride structure. The SiC structure includes a drain electrode, a substrate layer that is formed on the drain electrode and includes SiC, and a drift layer formed on the substrate layer. The drift layer includes p-well regions that allow current to flow through a region between the p-well regions. The III-nitride structure includes a set of III-nitride semiconductor layers formed on the SiC structure, a passivation layer formed on the set of III-nitride semiconductor layers, a source electrode electrically coupled to the p-well regions, and gate electrodes electrically isolated from the set of III-nitride semiconductor layers. In an aspect, the SiC structure includes a transition layer that includes connecting regions. In another aspect, the III-nitride structures includes connection electrodes electrically coupled to the connecting regions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.