Patent · US Active

Laser device and process for fabricating such a laser device

US10511147B2 · kind B2 · utility

0Cited by
2References
11Claims
0Family size

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Key dates

Filing dateMay 30, 2018
Grant dateDec 17, 2019
Priority date
Expiry dateMay 30, 2038

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01S2301/166
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

The invention relates to a III-V heterostructure laser device (1) arranged in and/or on silicon, comprising: The optical rib waveguide (11) is oriented so that at least one Bragg grating (19, 19a, 19b) is arranged on that side (21) of the slab waveguide (15) which is proximal relative to the gain medium (3) and in that the rib (17) is placed on that side (23) of the slab waveguide (15) that is distal relative to the gain medium (3).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.