Sensor arrangement for a lithography system, lithography system, and method for operating a lithography system

US10514619B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Ulrich Bihr · Bopfingen, DE
• Markus Holz · Aalen, DE
• Jan Horn · Munich, DE

Key dates

• Filing date: Jan 23, 2018
• Grant date: Dec 24, 2019
• Expiry date: Jan 23, 2038

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70116
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The disclosure provides a sensor arrangement for sensing a position of an optical element in a lithography system. The sensor arrangement includes: a first capacitive sensor device having a position-dependent variable first sensor capacitance that can be sensed using a first excitation signal; a second capacitive sensor device having a position-dependent variable second sensor capacitance that can be sensed using a second excitation signal; and a control device configured to produce the first and second excitation signals so that charges present on a parasitic capacitance associable with the first sensor device are at least partially compensated for by charges that are present on a parasitic capacitance associable with the second sensor device via a signal path outside the first and/or the second excitation signal path.