Enhanced etch anisotropy using nanoparticles as banking agents in the presence or absence of a magnetic or electrical field
US10515824B2 · kind B2 · utility
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Key dates
| Filing date | Jan 11, 2018 |
| Grant date | Dec 24, 2019 |
| Priority date | — |
| Expiry date | Jan 11, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2201/0257
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of anisotropic etching comprises forming a metal layer above a substrate. A mask layer is formed on the metal layer with openings defined in the mask layer to expose portions of the metal layer. The exposed portions of the metal layer are introduced to an active etchant solution that includes nanoparticles as an insoluble banking agent. In further embodiments, the exposed portions of the metal layer are introduced to a magnetic and/or an electrical field.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.