Photoresists comprising ionic compound
US10527934B2 · kind B2 · utility
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9Claims
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Assignee
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Key dates
| Filing date | Oct 31, 2012 |
| Grant date | Jan 7, 2020 |
| Priority date | — |
| Expiry date | Feb 8, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2041
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
New photoresist compositions are provided that comprise a component that comprises a radiation-insensitive ionic compound. Preferred photoresists of the invention may comprise a resin with photoacid-labile groups; a photoacid generator compound; and a radiation-insensitive ionic compound that can function to decrease undesired photogenerated-acid diffusion out of unexposed regions of a photoresist coating layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.