Inventor · Shrewsbury, MA, US

Chunyi Wu

25Patents
4h-index
23Co-inventors
59Inventor score

Filing activity: Jun 4, 2003 → Mar 11, 2021

Most-cited inventions

PatentTitleAreaCited byStatus
US7128822B2 Leveler compounds Chemistry; Metallurgy 31 Expired
US7662981B2 Leveler compounds Electricity 16 Active
US8241832B2 Compositions and processes for photolithography Physics 16 Active
US7510639B2 Leveler compounds Electricity 13 Active
US9012128B2 Photoresist and coated substrate comprising same Chemistry; Metallurgy 3 Active
US8722825B2 Surface active additive and photoresist composition comprising same Chemistry; Metallurgy 3 Active
US8603728B2 Polymer composition and photoresist comprising the polymer Physics 3 Active
US9274427B2 Compositions and processes for photolithography Chemistry; Metallurgy 2 Active
US8883400B2 Compositions and processes for photolithography Physics 2 Active
US9005880B2 Compositions comprising sulfonamide material and processes for photolithography Physics 1 Active
US9122159B2 Compositions and processes for photolithography Physics 1 Active
US9436082B2 Compositions comprising base-reactive component and processes for photolithography Physics 1 Active
US9507260B2 Compositions and processes for photolithography Physics 0 Active
US9475763B2 Photoresist comprising nitrogen-containing compound Physics 0 Active
US11846885B2 Topcoat compositions and photolithographic methods Electricity 0 Active
US11940731B2 Photoresist topcoat compositions and methods of processing photoresist compositions Physics 0 Active
US10558122B2 Compositions comprising sulfonamide material and processes for photolithography Physics 0 Active
US8927190B2 Photoresist comprising nitrogen-containing compound Physics 0 Active
US12234369B2 Photoresist topcoat compositions and methods of processing photoresist compositions Physics 0 Active
US10133179B2 Pattern treatment methods Physics 0 Active
US11809077B2 Photoresist compositions and pattern formation methods Physics 0 Active
US8748080B2 Compositions and processes for photolithography Chemistry; Metallurgy 0 Active
US10719014B2 Photoresists comprising amide component Physics 0 Active
US10527934B2 Photoresists comprising ionic compound Physics 0 Active
US8808967B2 Compositions and processes for photolithography Physics 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.