Patent · US Active

Cleaning formulations for removing residues on semiconductor substrates

US10533146B2 · kind B2 · utility

7Cited by

3References

64Claims

0Family size

Assignee

Fujifilm Electronic Materials U.S.A., Inc. · US

Inventors

Keeyoung Park · Shizuoka, JP
Emil A. Kneer · Mesa, US
Thomas Dory · Gilbert, US
Tomonori Takahashi · Chita, JP

Key dates

Filing date	Oct 5, 2017
Grant date	Jan 14, 2020
Priority date	—
Expiry date	Dec 8, 2037

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC11D2111/22
WIPO fieldBasic materials chemistry
WIPO sectorChemistry

Abstract

This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers; 3) at least one metal-containing additive; and 4) water.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.