Keeyoung Park
11Patents
1h-index
7Co-inventors
39Inventor score
Filing activity: Dec 2, 2015 → Aug 16, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10533146B2 | Cleaning formulations for removing residues on semiconductor substrates | Chemistry; Metallurgy | 7 | Active |
| US11508569B2 | Surface treatment compositions and methods | Performing Operations; Transporting | 1 | Active |
| US10593538B2 | Surface treatment methods and compositions therefor | Chemistry; Metallurgy | 1 | Active |
| US10619126B2 | Cleaning compositions and methods of use therefor | Chemistry; Metallurgy | 1 | Active |
| US9809746B2 | Etching liquid, kit of same, etching method using same, method for producing semiconductor substrate product, and method for manufacturing semiconductor element | Electricity | 0 | Active |
| US11447642B2 | Methods of using surface treatment compositions | Electricity | 0 | Active |
| US11174394B2 | Surface treatment compositions and articles containing same | Electricity | 0 | Active |
| US10049883B2 | MRAM dry etching residue removal composition, method of producing magnetoresistive random access memory, and cobalt removal composition | Physics | 0 | Active |
| US10714682B2 | Ruthenium removal composition and method of producing magnetoresistive random access memory | Electricity | 0 | Active |
| US11456412B2 | Ruthenium removal composition and method of producing magnetoresistive random access memory | Electricity | 0 | Active |
| US12150386B2 | Ruthenium removal composition and method of producing magnetoresistive random access memory | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.