Pellicle for photomask, reticle including the same, and exposure apparatus for lithography
US10539868B2 · kind B2 · utility
3Cited by
4References
34Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 8, 2017 |
| Grant date | Jan 21, 2020 |
| Priority date | — |
| Expiry date | Mar 26, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02601
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A pellicle for a photomask, a reticle including the same, and an exposure apparatus for lithography are provided. The pellicle may include a pellicle membrane, and the pellicle membrane may include nanocrystalline graphene. The nanocrystalline graphene may have defects. The nanocrystalline graphene may include a plurality of nanoscale crystal grains, and the nanoscale crystal grains may include a two-dimensional (2D) carbon structure having an aromatic ring structure. The defects of the nanocrystalline graphene may include at least one of an sp3 carbon atom, an oxygen atom, a nitrogen atom, or a carbon vacancy.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.