Photoresists comprising carbamate component
US10539870B2 · kind B2 · utility
2Cited by
4References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 31, 2013 |
| Grant date | Jan 21, 2020 |
| Priority date | — |
| Expiry date | May 31, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0392
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
New photoresist compositions are provided that comprise a carbamate compound that comprises 1) a carbamate group and 2) an ester group. Preferred photoresists of the invention may comprise a resin with acid-labile groups; an acid generator compound; and a carbamate compound that can function to decrease undesired photogenerated-acid diffusion out of unexposed regions of a photoresist coating layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.