William Williams, III
22Patents
9h-index
30Co-inventors
75Inventor score
Filing activity: Dec 22, 1978 → Dec 6, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5661042A | Process for electrically connecting electrical devices using a conductive anisotropic material | Electricity | 51 | Expired |
| US5469072A | Integrated circuit test system | Physics | 48 | Expired |
| US5556808A | Method for aligning a semiconductor device | Emerging Cross-Sectional Technologies | 48 | Expired |
| US5773986A | Semiconductor wafer contact system and method for contacting a semiconductor wafer | Electricity | 44 | Expired |
| US5629630A | Semiconductor wafer contact system and method for contacting a semiconductor wafer | Physics | 30 | Expired |
| US6937047B2 | Integrated circuit with test pad structure and method of testing | Electricity | 21 | Expired |
| US5602491A | Integrated circuit testing board having constrained thermal expansion characteristics | Electricity | 20 | Expired |
| US5087877A | Test contact fixture using flexible circuit tape | Physics | 15 | Expired |
| US4936616A | Engine tilting device | Performing Operations; Transporting | 14 | Expired |
| US5330919A | Method for electrically testing a semiconductor die using a test apparatus having an independent conductive plane | Emerging Cross-Sectional Technologies | 7 | Expired |
| US8900794B2 | Photoacid generator and photoresist comprising same | Chemistry; Metallurgy | 5 | Active |
| US4595427A | Annealing process control method and apparatus | Chemistry; Metallurgy | 4 | Expired |
| US10539870B2 | Photoresists comprising carbamate component | Physics | 2 | Active |
| US4235590A | Tinted UV cured coatings for photoflash lamps | Mechanical Engineering; Lighting; Heating | 2 | Expired |
| US8956799B2 | Photoacid generator and photoresist comprising same | Physics | 2 | Active |
| US9721618B2 | Storage cartridge dock system | Emerging Cross-Sectional Technologies | 1 | Active |
| US9921475B1 | Photoacid-generating compound, polymer derived therefrom, photoresist composition including the photoacid-generating compound or polymer, and method of forming a photoresist relief image | Chemistry; Metallurgy | 1 | Active |
| US10509315B2 | Photoacid generator | Chemistry; Metallurgy | 0 | Active |
| US9146470B2 | Photoacid generator and photoresist comprising same | Chemistry; Metallurgy | 0 | Active |
| US10317795B2 | Photoacid generator | Chemistry; Metallurgy | 0 | Active |
| US11960206B2 | Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device | Chemistry; Metallurgy | 0 | Active |
| US11550217B2 | Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.