Distorted fingerprint matching using pose and minutia grouping
US10546179B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 31, 2017 |
| Grant date | Jan 28, 2020 |
| Priority date | — |
| Expiry date | Jul 16, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06V40/1353
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A list of possible mated minutiae in a reference fingerprint and a search fingerprint is identified. The list of possible mated minutiae is divided into different groups of mated minutiae using pose grouping based on rigid transformation parameters. For each group, the possible mated minutiae are filtered to get a set of consistent mated minutiae pairs having similar rigid transformation. The topological consistency between groups is determined. If any two groups are topologically consistent to each other, they are merged to form a (virtual) larger group. A non-linear transformation parameters are estimated from the the mated minutiae in the merged group. The overall similarity of mated and non-mated minutiae in the overlapping area is determined after non-linear alignment of the two fingerprints, and the maximum similarity is output as the final similarity score between two fingerprints.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.