Patent · US Active

High-voltage supply unit and circuit arrangement for generating a high voltage for a particle beam apparatus

US10546717B2 · kind B2 · utility

0Cited by

6References

19Claims

0Family size

Assignee

Carl Zeiss Microscopy GmbH · DE

Inventors

Edgar Fichter · Aalen, DE
Joerg Fober · Heubach, DE
Dirk Preikszas · Oberkochen, DE
Christian Hendrich · Aalen, DE
Michael Schnell · Ingolstadt, DE
Momme Mommsen · Oberkochen, DE

Key dates

Filing date	Mar 19, 2018
Grant date	Jan 28, 2020
Priority date	—
Expiry date	Mar 19, 2038

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/002
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

The system described herein relates to a high-voltage supply unit for providing an output voltage for a particle beam apparatus, wherein the particle beam apparatus is embodied as, for example, an electron beam apparatus and/or an ion beam apparatus. The system described herein is based on the fact that it was recognized that a bipolar voltage supply unit can be formed by means of a unipolar first current source and a unipolar second current source, said bipolar voltage supply unit enabling a load current in two directions. The high-voltage supply unit according to the system described herein can be operated in the 4-quadrant operation. In the 4-quadrant operation, a first voltage source for supplying the first current source and a second voltage source for supplying the second current source are embodied as different voltage sources.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.