Patent · US Active

Mixed gas multiple line supply system and substrate processing apparatus using same

US10550471B2 · kind B2 · utility

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10Claims
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Assignee

Inventors

Key dates

Filing dateMar 1, 2017
Grant dateFeb 4, 2020
Priority date
Expiry dateJan 19, 2038

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC23C16/52
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A mixed gas multiple line supply system includes a flow splitter connected to a common mixed gas supplying passage, the flow splitter configured to split a mixed gas into a plurality of supply lines while adjusting a ratio of flow rates in the plurality of supply lines, and an least one injector including a gas introducing port and a gas discharge hole for each of a plurality of regions in the processing container and configured to supply the mixed gas to each of the plurality of regions. The plurality of supply lines of the flow splitter are connected in one-to-one correspondence to the respective gas introducing ports provided for the plurality of regions in the processing container.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.