Patent · US Active

Laser resealing with stress-reducing prestructuring

US10556789B2 · kind B2 · utility

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16Claims
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Assignee

Inventors

Key dates

Filing dateOct 19, 2016
Grant dateFeb 11, 2020
Priority date
Expiry dateApr 29, 2038

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB81C2203/036
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

A method for manufacturing a micromechanical component including a substrate and a cap connected to the substrate and together with the substrate enclosing a first cavity, a first pressure prevailing and a first gas mixture with a first chemical composition being enclosed in the first cavity: in a first method step, an access opening, connecting the first cavity to surroundings of the micromechanical component, being formed in the substrate or in the cap; in a second method step, the first pressure and/or the first chemical composition being adjusted in the first cavity; in a third method step, the access opening being sealed by introducing energy and heat into an absorbing part of the substrate or the cap with the aid of a laser; in a fourth method step, a recess being formed, and/or an elevation being formed, and/or a reflection area being formed, and/or an absorption area being formed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.