Nanoimprint lithography system and method
US10569449B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 13, 2017 |
| Grant date | Feb 25, 2020 |
| Priority date | — |
| Expiry date | Feb 14, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/033
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A method for transferring a pattern from a template to a nanoimprint object. A perimeter portion of the nanoimprint object is supported by a perimeter support structure. A gas pressure induced force is applied to the nanoimprint object to facilitate bending of a central portion of the nanoimprint object in a direction toward a surface of the template until the central portion of the nanoimprint object is brought into contact with the surface of the template. While the nanoimprint object is held in contact with the surface of the template, the pattern from the template is transferred to a surface of the nanoimprint object thereby creating a patterned surface on the nanoimprint object.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.