Matthew E. Colburn
172Patents
25h-index
153Co-inventors
93Inventor score
Filing activity: Mar 11, 1999 → Apr 27, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6334960B1 | Step and flash imprint lithography | Emerging Cross-Sectional Technologies | 458 | Expired |
| US6696220B2 | Template for room temperature, low pressure micro-and nano-imprint lithography | Emerging Cross-Sectional Technologies | 296 | Expired |
| US6719915B2 | Step and flash imprint lithography | Emerging Cross-Sectional Technologies | 130 | Expired |
| US6921615B2 | High-resolution overlay alignment methods for imprint lithography | Emerging Cross-Sectional Technologies | 89 | Expired |
| US6916585B2 | Method of varying template dimensions to achieve alignment during imprint lithography | Emerging Cross-Sectional Technologies | 69 | Expired |
| US7037744B2 | Method for fabricating a self-aligned nanocolumnar airbridge and structure produced thereby | Electricity | 68 | Expired |
| US6842229B2 | Imprint lithography template comprising alignment marks | Emerging Cross-Sectional Technologies | 67 | Expired |
| US6911400B2 | Nonlithographic method to produce self-aligned mask, articles produced by same and compositions for same | Emerging Cross-Sectional Technologies | 58 | Expired |
| US7030495B2 | Method for fabricating a self-aligned nanocolumnar airbridge and structure produced thereby | Electricity | 58 | Expired |
| US6954275B2 | Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography | Performing Operations; Transporting | 57 | Expired |
| US7361991B2 | Closed air gap interconnect structure | Electricity | 48 | Expired |
| US7229273B2 | Imprint lithography template having a feature size under 250 nm | Emerging Cross-Sectional Technologies | 45 | Expired |
| US10732351B2 | Gratings with variable depths formed using planarization for waveguide displays | Electricity | 41 | Active |
| US10569449B1 | Nanoimprint lithography system and method | Physics | 41 | Active |
| US10823887B1 | Diffraction grating with a variable refractive index using multiple resins | Physics | 39 | Active |
| US10983257B1 | Fabrication of self-aligned grating elements with high refractive index for waveguide displays | Physics | 38 | Active |
| US7179758B2 | Recovery of hydrophobicity of low-k and ultra low-k organosilicate films used as inter metal dielectrics | Electricity | 37 | Expired |
| US10613268B1 | High refractive index gratings for waveguide displays manufactured by self-aligned stacked process | Physics | 36 | Active |
| US6986975B2 | Method of aligning a template with a substrate employing moire patterns | Emerging Cross-Sectional Technologies | 34 | Expired |
| US7883832B2 | Method and apparatus for direct referencing of top surface of workpiece during imprint lithography | Performing Operations; Transporting | 31 | Active |
| US8853085B1 | Grapho-epitaxy DSA process with dimension control of template pattern | Electricity | 30 | Active |
| US7790350B2 | Method and materials for patterning a neutral surface | Electricity | 29 | Active |
| US6919152B2 | High resolution overlay alignment systems for imprint lithography | Emerging Cross-Sectional Technologies | 29 | Expired |
| US6902853B2 | Dual wavelength method of determining a relative position of a substrate and a template | Emerging Cross-Sectional Technologies | 26 | Expired |
| US7514361B2 | Selective thin metal cap process | Electricity | 25 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.